Inseto
Semiconductor Process Furnaces
ATV's PEO range of multipurpose, energy efficient, fast ramping furnaces are designed for semiconductor and related device processing, from R&D through low to medium volume production.
The "hot wall" systems are space saving in their design, incorporating Kanthal ® heaters and a removable quartz process chamber, making them ideal for multi-processes including: Oxidation, Annealing, Polyimide Curing, LPCVD, Diffusion, Wet/Dry Thermal SiO2, Epitaxy, HCI-cleaning, Sintering, Reflow etc. The furnaces are available in various models including bench-top versions for 4" and 8" wafers/devices and stand-alone versions for 8 & 12" wafers/devices.
Features include:
- Low energy/gas consumption during stand by process mode
- Loading at room temperature
- Flexible control software with up to 100 steps per program
- Max. 1100°C continuous wafer/substrate temperature
- Excellent low temperature capability
- Ultimate vacuum ~ 7 x 10-7 mbar
- Space saving design
- Fastest ramping: within 15 minutes up to 1 000°C - less 60 minutes to < 100 °C
- Semiconductor grade quartz glass process chamber
- Multipurpose: with easy swap quartz glass In Liners/elephants
- Semi S II safety standards for PH3/B2H6/GeH4/SeH2
Product range overview:
| PEO-601 | PEO-603 | PEO-604 | PEO-612 |
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| Tabletop Furnace 100mm (4") Dia Wafers 6x1kW Kanthal® Heaters 1100 Deg C Range |
Tabletop Furnace 200mm (8") Dia Wafers 12x1.6kW Kanthal® Heaters 1100 Deg C Range |
Free Standing Furnace 200mm (8") Dia Wafers 12x1.6kW Kanthal® Heaters 1100 Deg C Range (higher on request) |
Free Standing Furnace 300mm (12"") Dia Wafers 24x 1.6kW Kanthal® Heaters 1100 Deg C Range (higher on request) |
Further
Information On ATV Multi-Purpose Furnaces: |
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 Datasheet (PDF) |
ATV PEO Furnace Model Range Datasheet 235kB | ||
 Video (AVI) |
ATV PEO-603 Video (62MB) | ||
| Applications | LPCVD, CVD, Epitaxy, Polysilicon, Silicon Nitride, LTO, TEOS, solid/liquid/gas precursor diffusion, low k, HSQ, HMDS, wet/dry thermal oxide, Pyrogenic oxidation, VECSEL, MOCVD, Trans LC, Si nano wires, post implanting annealing, carbon nano tubes, Graphene, solar cell, batch ALD, Polyimide/BCB curing, wafer bump reflow, alloying, thick film paste firing, LTCC sintering, annealing under inert atmosphere/Hydrogen/high vacuum, Tellurium/Se/Hg PVD |
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| Industry Segments | Universtities,
Research Development, Production,
Semiconductor, Medical, Photonics, LTCC, Solar Cell, Photo Voltaic, RF & Microwave Electronics, Microelectronics etc. |
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| Technical Advice | |||
| ATV Website |  |
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| Region | Available
from Inseto in the United Kingdom, Ireland & Scandinavia |
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