Photomask Equipment by SÜSS MicroTec
SUSS MicroTec’s suite of Wafer / Reticule cleaning and Photomask fabrication equipment; wafer and mask cleaning systems with both semi and fully automatic processing capabilities.
Fully automated mask fabrication equipment including bake, clean and develop, from standard through to EUVL and NIL requirements.
Semiautomatic mask cleaning, developing, etching and resist stripping equipment.
Fully automated photomask production platform for 250-65nm technology nodes.
Next-generation lithography for photomask clean, bake and develop.
See the full SÜSS MicroTec product range
Tel: +44 (0)1264 334505
UV Lithography, Wafer Resist Coating with Spin, Spray or Puddle Dispense, Resist Developing, Wafer Cleaning, Metal Layer Lift Off, Baking, Wafer Prime etc.
Wafer level chip-scale packaging, flip chip packaging, bumping, MEMS, LED, power devices, optical components and compound substrates and other semiconductor related device R&D applications
SÜSS MicroTec Website
United Kingdom and Ireland