Photomask Equipment by SÜSS MicroTec
SUSS MicroTec’s suite of Wafer / Reticule cleaning and Photomask fabrication equipment; wafer and mask cleaning systems with both semi and fully automatic processing capabilities.
Fully automated mask fabrication equipment including bake, clean and develop, from standard through to EUVL and NIL requirements.
HMx Series
Semiautomatic mask cleaning, developing, etching and resist stripping equipment.
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ASX Series
Fully automated photomask production platform for 250-65nm technology nodes.
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MaskTrack Pro
Next-generation lithography for photomask clean, bake and develop.
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SÜSS MicroTec
See the full SÜSS MicroTec product range
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Further Information
Applications
UV Lithography, Wafer Resist Coating with Spin, Spray or Puddle Dispense, Resist Developing, Wafer Cleaning, Metal Layer Lift Off, Baking, Wafer Prime etc.
Industry Segments
Wafer level chip-scale packaging, flip chip packaging, bumping, MEMS, LED, power devices, optical components and compound substrates and other semiconductor related device R&D applications
SÜSS MicroTec Website
Region
United Kingdom and Ireland
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