Industrial Plasma Etching Equipment: MK-III

MK-III Key Features

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The MK-III is our MK-II times two…but not twice the footprint. The Mark III (MK-III) industrial plasma etcher for volume production applications has two large aluminium chambers with 24 active processing levels of 24×18″ (custom configurations available) in each of the dual chambers. The system can operate both chambers simultaneously or independently and is built as an extension of the proven MK-II platform. The MK-III is the choice of discerning engineers.

MK-III standard features include:

  • Dual Chamber configuration
  • 6, 8, 12, 16 & 24 “Shelf” Systems available
  • Each shelf is 24” x 18” on 1.5” Spacing
  • R.F. Generator & Automatic Matching Network
  • R.F. 1250 to 5000 Watts @ 13.56MHz
  • Electrostatic Shielding of chamber for uniformity
  • Process Temperature Control
  • Two Mass Flow Controllers, 0-2000 SCCM
  • Low gas supply pressure alarms
  • MKS 0-10 Torr Capacitance Vacuum Gauge
  • Microprocessor Control System
  • Touch Screen interface with Multiple Recipe Storage
  • Edwards Oxygen Service Vacuum Pump
  • Edwards Roots style Booster Blower
  • 3 Micron Vacuum Pump Oil Filtration
  • Two point Automatic N2 Pump Purging
  • Oil Mist Coalescing Filter on the Vacuum Pump
  • Footprint, Plasma Console 1680x2000x660mm
  • Footprint, Vacuum Pump 400x760x430mm
  • Weight varies with configuration

Optional System Features:

  • Windows Computer Control System
  • Data Recording, Reporting and printing
  • Signal Light Tower
  • Edwards GV80 Dry Vacuum Pump
  • MKS Automatic Throttle Vacuum Controller
  • Up to 4 Mass Flow Controllers
  • Process controlled Gas steering matrix
  • Controlled Rate N2 Chamber Purging
  • Custom Chamber sizes and configurations
  • Custom Electrode sizes and configurations
  • Closed Loop Chiller for RF generator cooling
  • Packed Bed Fume Scrubber for vacuum pump exhaust
  • Heatless Compressed Air Dryer

Please contact us for the full range of options.

Further Information

Contact Us

Tel: +44 (0)1264 334505



Industrial Reactive Ion Etching, Device Etch Back, PCB Bare Board Manufacturing of PTFE, Polyamide or Rigid-Flex Circuit Boards, Drilling Coated Microvias, Etching Polyimide Windows etc.

Industry Segments

Printed Circuit Board Manufacturers, Flexible Circuit Industries, Medical, Plastic, Glass, Automotive, Dental, Aerospace, PV, Military, Telecommunications, Electronics, Industrial, Solar Cell etc.

Plasma Etch Inc. Website


United Kingdom, Ireland & Scandinavia/Nordic Regions: Finland, Sweden, Norway & Denmark, Netherlands, France & Benelux

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