PEO-601 Tabletop Quartz Tube Furnace
- Small footprint wafer furnace for up to 100mm diameter wafers
- 1100°C maximum operating temperature
- Up to 100 programmable process steps & unlimited process recipes
- Maximum three input gas lines with digital flow-meters
- Heating/cooling rates down to 1K/100min
- < 5ppm Oxygen with 2 times vacuum-N2-backfill routine
ATV’s PEO-601 is a table-top quartz tube batch furnace for horizontal processing of up to 100mm (4″) diameter Semiconductor Wafers or Substrates. Six powerful 1kW Heaters ramp the system to 1000°C in < 30minutes and up to a maximum of 1100°C.
Features and capabilities include up to three digital flow-meter input gas lines, residual oxygen levels: < 5ppm, low power consumption: <1,2kW at 1000°C and zero in ambient stand-by mode, a Windows based process recipe generation and management system: 100 steps per recipe, Step length 1s – 99:59 min, process data logging, several user levels, Barcode management and a PLC Controller.
The systems are ideal for research and development or low volume production, including wet and dry oxidation with/without P&N type source diffusion, annealing under inert/noble gas or vacuum for e.g. polyimide/BCB baking and thick film/glass paste firing etc., SiAl/SiAu/SiMo alloying, or for multiple processes without cross contamination by ATV’s easily replaceable quartz in-liner system.
PEO-603/4 200MM Quartz Tube Furnace
Wafer Coating – Developing
Tel: +44 (0)1264 334505
Wet Oxidation, Dry Oxidation, P Type Diffusion, N Type Diffusion, Annealing, Polyimide Curing, Vacuum Baking, Thick Film Firing, Glass Paste Firing
Universities, Research Development, Semiconductor Production, Medical, Photonics, LTCC, Solar Cell, Photo Voltaic, Compound Fabrication etc.
United Kingdom, Ireland & Scandinavia/Nordic Regions: Finland, Sweden, Norway & Denmark