ATV's PEO-601 is a table-top quartz tube batch furnace for horizontal processing of up to 100mm (4") diameter Semiconductor Wafers or Substrates. Six powerful 1kW Heaters ramp the system to 1000°C in < 30minutes and up to a maximum of 1100°C.
Features and capabilities include up to three digital flow-meter input gas lines, residual oxygen levels: < 5ppm, low power consumption: <1,2kW at 1000°C, a Windows (XP/7) based process recipe generation and management system: 100steps per recipe, Step length 1s - 99:59min, process data logging, several user levels, Barcode management and a PLC Controller.
The systems are ideal for research and development or low volume production, including wet and dry oxidation with/without P&N type source diffusion, annealing under inert/noble gas or vacuum for e.g. polyimide/BCB baking and thick film/glass paste firing etc., or for multiple processes without cross contamination by ATV's easily replaceable quartz in-liner system.
The system features include:
FURTHER INFORMATION & REQUEST FORM:
Tel: +44 (0)1264 334505
Wet Oxidation, Dry Oxidation, P Type Diffusion, N Type Diffusion, Annealing, Polyimide Curing, Vacuum Baking, Thick Film Firing, Glass Paste Firing
Universities, Research Development, Semiconductor Production, Medical, Photonics, LTCC, Solar Cell, Photo Voltaic, Compound Fabrication etc.
United Kingdom, Ireland & Scandinavia/Nordic Regions: Finland, Sweden, Norway & Denmark