PEO-603 SEMICONDUCTOR FURNACE FOR 200mm WAFERS

ATV's PEO-603 is a 230mm diameter quartz tube furnace for horizontal batch processing of up to 50 off 200mm (8") diameter Semiconductor Wafers or Substrates. Twelve powerful 1.6kW Heaters in three zones, plus front and rear disk heaters ramp the system to 1000°C in < 30minutes and up to a maximum of 1100°C.

The systems are floor-space saving (<2 m2) and energy saving, with no power or gas consumption during stand-by mode as product is loaded at room temperature, ramped up to various process temperatures and soaks and then actively cooled down to near room temperature prior to unload.

Features and capabilities include up to three digital flow-meter input gas lines, residual oxygen levels: < 1ppm, vacuum capability to 5x10-6mbar, low power consumption: Windows (XP/7) based process recipe generation and management system: 100steps per recipe, Step length 1s - 99:59min, process data logging, several user levels, Barcode management and a PLC Controller.

The systems are ideal for research and development or low volume production, including wet and dry oxidation with/without P&N type source diffusion, annealing under inert/noble gas or vacuum for e.g. polyimide/BCB baking and thick film/glass paste firing etc., or for multiple processes without cross contamination by ATV's easily replaceable quartz in-liner system.

The system features include:

• Proven ATV quality, components and reliability
• Small Footprint Table-top Systems
• Chamber size: 230mmØ, 370mm depth approx. 15.4 l
• 1100 °C maximum operating temperature
• Oxygen <1ppm with 2 x vacuum N2 back fill routine
• Up to 100 process steps per reflow profile
• Unlimited Process Recipes
• Optional through wall installation possible
• Maximum three input gas lines with digital flow-meters