The Mark III (MKIII) industrial plasma etcher for volume production applications has two large aluminium chambers with 24 active processing levels of 24x18" (custom configurations available) in each of the dual chambers. The system can operate both chambers simultaneously or independently and is built as an extension of the proven MK-II platform.
MKIII standard features include:
Optional System Features
Please contact us for the full range of options.
FURTHER INFORMATION & REQUEST FORM:
Tel: +44 (0)1264 334505
Industrial Reactive Ion Etching, Device Etch Back, PCB Bare Board Manufacturing of PTFE, Polyamide or Rigid-Flex Circuit Boards, Drilling Coated Microvias, Etching Polyimide Windows etc.
Printed Circuit Board Manufacturers, Flexible Circuit Industries, Medical, Plastic, Glass, Automotive, Dental, Aerospace, PV, Military, Telecommunications, Electronics, Industrial, Solar Cell etc.
Plasma Etch Inc. Website
United Kingdom, Ireland & Scandinavia/Nordic Regions: Finland, Sweden, Norway & Denmark, Netherlands, France & Benelux